该产品可用于氮化物深紫外波段光电子器件与电子电力器件衬底,从因此能够从基础上通过降低其上材料缺陷密度而提高器件性能与良率,是研制高性能氮化物器件的前提条件。该产品为平片蓝宝石生长高温退火工艺制备。可为深紫外基光电器件组装制备奠定良好基础。
Parameters | Specification |
Materials | AIN (Flat Sapphire Substrate) |
Diameter | 50.8 mm |
Substrate thickness | 430 ± 10 µm |
Orientation | c-plane ± 0.2° |
Primary flat orientation | a-plane |
Primary flat length | 16 ± 1 mm |
AlN thickness | 0.5 µm ~ 1.5 µm |
(002)Rocking curve | ≤ 60 arcsec |
(102)Rocking curve | ≤ 190 arcsec |
Edge excluding length | ≤ 2 mm |
Surface roughness | ≤ 0.8 nm |
Thickness uniformity | ≤ 2% |